LPCVD equipment is one of the important equipments for semiconductor integrated circuit manufacturing,which is mainly used for the growth of LP-POLY,LP-DPOLY,LP-SiN，LP-TEOS thin films.

♦ 立式LPCVD采用鐘罩式結構，設計嵌套腔體機械手傳片組件、舟旋轉組件，具有占地面積小、成膜均勻性高、工藝穩定性高等優點。

Vertical LPCVD adopts bell jar structure, and designs nested cavity manipulator film transmission assembly and boat rotation assembly, which has the advantages of small occupied area, high film formation uniformity and high process stability.

產品特點/Product Characteristics：

♦ 全自動傳送，定位精準，穩定可靠

Fully automatic transmission, accurate positioning, stability and reliabilityt

♦ 高潔凈度工藝環境，有效控制污染

High cleanliness process environment, effective pollution control

技術指標/Technical Indicators：

♦ 晶片尺寸：6/8/12英寸 Wafer size: 6/8/12 inches

♦ 制程溫度范圍：300°C-1000°C Process temperature range: 300°C-1000°C

♦ 批次片數: 100-150片 Batch capacity: 100-150 pcs

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